Planning

Supply and commissioning of an Atomic Layer Deposition Coating System

  • University of Strathclyde

F01: Prior information notice (prior information only)

Notice identifier: 2025/S 000-008702

Procurement identifier (OCID): ocds-h6vhtk-04eb70

Published 11 March 2025, 12:08pm



Section one: Contracting authority

one.1) Name and addresses

University of Strathclyde

Learning & Teaching Building, 49 Richmond Street

Glasgow

G1 1XU

Contact

Rene de Sousa

Email

rene.de-sousa@strath.ac.uk

Country

United Kingdom

NUTS code

UKM82 - Glasgow City

Internet address(es)

Main address

http://www.strath.ac.uk/

Buyer's address

https://www.publiccontractsscotland.gov.uk/search/Search_AuthProfile.aspx?ID=AA00113

one.2) Information about joint procurement

The contract is awarded by a central purchasing body

one.3) Communication

Additional information can be obtained from the above-mentioned address

one.4) Type of the contracting authority

Body governed by public law

one.5) Main activity

Education


Section two: Object

two.1) Scope of the procurement

two.1.1) Title

Supply and commissioning of an Atomic Layer Deposition Coating System

Reference number

UOS-36340-2025

two.1.2) Main CPV code

  • 38000000 - Laboratory, optical and precision equipments (excl. glasses)

two.1.3) Type of contract

Supplies

two.1.4) Short description

An Atomic Layer Deposition system is sought after to encapsulate semiconductor active devices such as (but not limited to) Gallium Nitride and Silicon. The ideal system will be deployed for academic research and located within a cleanroom micro-fabrication facility.

two.1.6) Information about lots

This contract is divided into lots: No

two.2) Description

two.2.2) Additional CPV code(s)

  • 31712100 - Microelectronic machinery and apparatus

two.2.3) Place of performance

NUTS codes
  • UKM82 - Glasgow City
Main site or place of performance

The University of Strathclyde

two.2.4) Description of the procurement

The Institute of Photonics is seeking to complement their cleanroom micro-fabrication facility equipment with an Atomic Layer Deposition (ALD) system. The ALD will be used to encapsulate semiconductor active devices typically (but not limited to) Gallium Nitride (GaN) light-emitting diodes and Silicon (Si)/ metal-based electrodes. The system will be employed for academic research. It is purposed to bring the unique capability of conformal nanoscale growth of dielectric materials, such as Hafnium oxide (HfO2) and Silica (SiO2), with low-pinhole density. The precursors should be contained within the system itself. Option for high and low (plasma-assisted) temperatures deposition are considered.

The system should allow the load-lock loading and process of a single 4” wafer.

two.2.14) Additional information

The University is publishing this PIN for initial Market Research and Engagement purposes. The University may conduct further market engagement with the suppliers that note interest in this opportunity.

two.3) Estimated date of publication of contract notice

12 March 2025


Section four. Procedure

four.1) Description

four.1.8) Information about the Government Procurement Agreement (GPA)

The procurement is covered by the Government Procurement Agreement: Yes


Section six. Complementary information

six.3) Additional information

NOTE: To register your interest in this notice and obtain any additional information please visit the Public Contracts Scotland Web Site at https://www.publiccontractsscotland.gov.uk/Search/Search_Switch.aspx?ID=792918.

(SC Ref:792918)